- Original Paper
Kentaro Nagamatsu, Shota Tsuda, Takumi Miyagawa, Reiya Aono, Hideki Hirayama, Yuusuke Takashima and Yoshiki Naoi , Reduction of parasitic reaction in high temperature AlN growth by jet stream gas flow metal organic vapor phase epitaxy, Scientific Reports, Vol.12, 7662, (2022).
Kentaro Nagamatsu, Shota Tsuda, Takumi Miyagawa, Reiya Aono, Hideki Hirayama, Yuusuke Takashima and Yoshiki Naoi , Reduction of parasitic reaction in high temperature AlN growth by jet stream gas flow metal organic vapor phase epitaxy, Scientific Reports, Vol.12, 7662, (2022).